Prof. Taek Dong Chung develop dielectric film where current flows
Date : 2013/12/05 14:23 , Hit :
Prof. Taek Dong Chung and his research team, devoted to one of our research project entitled “Molecular Energy Integration System Technology”, developed a dielectric film where current flows.
The research team found that, under a specific condition, enough current can pass through the dielectric Oxidized Silicon Film and, by controlling the current flow, a variety of electro-chemical reactions can be induced thereon.
This research result is released in Nature Communications, November 2013.
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